About M&R Nano Technology Co.,Ltd
Our mission: "Striving for excellence in craftsmanship and insisting on innovation"
M&R Nano Technology Co., Ltd. can provide professional yellow light equipment (new/second-hand equipment such as cleaning, coating, exposure (photolithography), development, etching machines, glass mask design, etc.), as well as provide customers with clean and complete Our lithography laboratory, through R&D and experiments by a professional team, can also design "customized lithography equipment" that meets customer needs.
Our vision: "Become an expert in photo lithography process equipment and materials"
Photo lithography process equipment is one of the main equipment in microelectronics manufacturing and semiconductor industry. These devices are primarily used to create fine patterns on silicon wafers and other substrates to form the structures of integrated circuits and other microelectronic devices.
Main products and services
- Lithography system:
M&R Nano Technology Co., Ltd. can provide lithography equipment manufacturing services. The photolithography system uses ultraviolet light or other light sources of specific wavelengths to project predetermined patterns onto the surface of the silicon wafer through photoresists and masks. At this stage, the exact location and size of each component is determined. - Photoresist:
M&R Nano Technology Co., Ltd. can provide photoresist photosensitive material services. Photoresist is coated on the surface of the silicon wafer and exposed through a lithography system to form a photolithography pattern. Often exposed to ultraviolet or deep ultraviolet radiation. - Masking plate (photomask):
M&R Nano Technology Co., Ltd. can provide masking plate service. A mask is a clear plate of glass or quartz on which a photolithographic pattern of the desired pattern is printed. Projection from a photolithography system transfers this pattern onto the photoresist. Production requires high-precision craftsmanship. - Exposure light source (UV Led):
M&R Nano Technology Co., Ltd. can provide services for exposure light source (UV Led) generation. In addition to the light source provided by UV Led (365nm/405nm/435nm), it can also be used to modify the light source systems of various other manufacturers' exposure equipment. - Coating equipment and developing equipment:
M&R Nano Technology Co., Ltd. can provide various types of coating/development/photoresist removal/etching equipment manufacturing services. - Semiconductor peripheral systems:
M&R Nano Technology Co., Ltd. can provide semiconductor peripheral system. manufacturing services. Currently on sale: MCS (Mask Clean System) is a physical, non-mechanical or chemical contact mask cleaning equipment with high-efficiency removal.
Information
| | M&R Nano Technology Co.,Ltd |
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| | No. 10, Ln. 863, Gaoshi Rd., Yangmei Dist., Taoyuan City 326024, Taiwan (R.O.C.) |
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