Plasma Dry Etch Equipment

Plasma Dry Etch Equipment

Manufacturer:UVAT Technology Co., Ltd.

Product Description
Horizontal Plasma Etch Equipment
•Plasma Dry Etch
•Plasma Thin down
•Plasma Desmear
•Plasma Descum
•Plasma Pre-treatment
 
Equipment characteristic
High-speed dry etching process
•High etching uniformity
•Modular design to achieve low cost/low footprint
•Advanced packaging(Panel Fan-Out FOPLP/FOWLP)
•High-end carrier board application technology
•With semiconductor-grade EFEM configuration
 
DETAILS
Product Description
Horizontal Plasma Etch Equipment
•Plasma Dry Etch
•Plasma Thin down
•Plasma Desmear
•Plasma Descum
•Plasma Pre-treatment
 
Equipment characteristic
High-speed dry etching process
•High etching uniformity
•Modular design to achieve low cost/low footprint
•Advanced packaging(Panel Fan-Out FOPLP/FOWLP)
•High-end carrier board application technology
•With semiconductor-grade EFEM configuration​​​​​​​
MORE SOLUTIONS
close Site-wide search
close
closeAppointment
Company booked for consultation:
Please ensure filling in accurate information.Required fields, incomplete forms will not be answered.
Business nameex : ○○ Co. Ltd.
Nameex : Jason
Departmentex : R&D Department
Job titleex : R&D Manager
Telex : 0212345678
Mobileex : 0911222333
E-mailex : Please enter E-mail
E-mail confirmationex : Please confirm E-mail
Objectex: Technical partnership, sales, procurement, OEM, overseas business expansion
Captcha
I have read and agree to the Privacy Policy PRIVACY POLICY
iconSubmit